Sputtering Equipment SPK Series
High performance sputtering equipment is applied from R&D to small scale production.

  • Features
  • Specifications
  • Applications


  • Excellent film thickness uniformity by using the substrate holder to rotate.
  • Substrate holder is compatible for heat up and cool down.
  • Reversal sputtering function(Option).
  • With 3 cathodes,it provides to sputter simultaneously with 2~3 units.
  • Easy to unload substrates ・ exchange target
  • SPK‐L series with additional LL chamber is available.

Spec example SPK‐503

Equipment constitution
Load lock chamber batch type
Substrate size
MAX16 pieces/batch
Round planar type3units DC or RF
Fully automatic or semi-automatic


  • Magnetic recording media
  • Electronic parts
  • Research & Development
  • Others

Contact Us

We can customize the vacuum equipment according to your request, so please contact us.