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Sputtering Equipment SPK Series
High performance sputtering equipment is applied from R&D to small scale production.

  • Features
  • Specifications
  • Applications

Features

  • Excellent film thickness uniformity by using the substrate holder to rotate.
  • Substrate holder is compatible for heat up and cool down.
  • Reversal sputtering function（Option）.
  • With 3 cathodes,it provides to sputter simultaneously with 2～3 units.
  • Easy to unload substrates ・ exchange target
  • SPK‐L series with additional LL chamber is available.

Spec example　SPK‐503

Equipment constitution
Load lock chamber　batch type
Substrate size
W60XH120（holder）
MAX16 pieces/batch
Cathode
Round planar type３units DC or RF
Operation
Fully automatic or semi-automatic

Applications

  • Magnetic recording media
  • Electronic parts
  • Research & Development
  • Others

Contact Us

We can customize the vacuum equipment according to your request, so please contact us.

Inquiries about our products