OLED: Research & Development SystemResearch & Development System – Try-ELVESSManufacturing equipment for evaluating material development and process development

- Overview
- Specifications
Basics
Equipment name: Try-ELVESS
Features
This equipment is ideal for R&D of OLED and material development. This compact system integrates the O2 plasma cleaning chamber, organic emitting layer deposition chamber, metal electrode deposition chamber, and encapsulation chamber. Possible to create OLED device prototypes because there is no contact with the air from vapor deposition to encapsulation processes. Basic research on OLED devices can be conducted more efficiently.
Typical specifications
- Glass substrate
- 100 x 100 mm, with an effective deposition area of 82 x 90 mm
- Plasma cleaning chamber
- RF plasma power supply, O2 mass flow controller
- Deposition chamber #1
- Low-temperature cell evaporation source (8 pieces), pin mask positioning mechanism ±0.1 mm
- Deposition chamber #2
- Low-resistance heating evaporation source (4 pieces), pin mask positioning mechanism ±0.1 mm
- Delivery chamber
- Substrate delivery mechanism, N2 substitution mechanism
- Encapsulation chamber
- Manual laminating mechanism, UV lamp unit, N2 dehydration and circulation mechanism
- Passage chamber
- Exhaust: Fully automatic
Deposition: Semi-automatic operation
Encapsulation: Semi-automatic operation
- Control system
- Exhaust: Fully automatic
Deposition: Semi-automatic operation
Encapsulation: Manual operation
Film thickness control through crystal monitor sensor deposition control
- Options
- Electron beam gun evaporation source, high-temperature cell, oxygen meter, dry pump