OLED: Research & Development System
Research & Development System – Try-ELVESS
Manufacturing equipment for evaluating material development and process development

  • Overview
  • Specifications

Basics

Equipment name: Try-ELVESS

Features

This equipment is ideal for R&D of OLED and material development. This compact system integrates the O2 plasma cleaning chamber, organic emitting layer deposition chamber, metal electrode deposition chamber, and encapsulation chamber. Possible to create OLED device prototypes because there is no contact with the air from vapor deposition to encapsulation processes. Basic research on OLED devices can be conducted more efficiently.

Typical specifications

Glass substrate
100 x 100 mm, with an effective deposition area of 82 x 90 mm
Plasma cleaning chamber
RF plasma power supply, O2 mass flow controller
Deposition chamber #1
Low-temperature cell evaporation source (8 pieces), pin mask positioning mechanism ±0.1 mm
Deposition chamber #2
Low-resistance heating evaporation source (4 pieces), pin mask positioning mechanism ±0.1 mm
Delivery chamber
Substrate delivery mechanism, N2 substitution mechanism
Encapsulation chamber
Manual laminating mechanism, UV lamp unit, N2 dehydration and circulation mechanism
Passage chamber
Exhaust: Fully automatic
Deposition: Semi-automatic operation
Encapsulation: Semi-automatic operation
Control system
Exhaust: Fully automatic
Deposition: Semi-automatic operation
Encapsulation: Manual operation
Film thickness control through crystal monitor sensor deposition control
Options
Electron beam gun evaporation source, high-temperature cell, oxygen meter, dry pump